Zong Jie Shen, Chun Zhao, C. Z. Zhao, Ivona Z. Mitrovic, Li Yang, W. Y. Xu, Eng Gee Lim, T. Luo, Y. B. Huang. Characteristics of Ni/AlOx/Pt RRAM devices with various dielectric fabrication temperatures. In International Conference on IC Design and Technology, ICICDT 2019, Suzhou, China, June 17-19, 2019. pages 1-4, IEEE, 2019. [doi]
Abstract is missing.