Dan Shi, Ka-Meng Lei, Rui Paulo Martins, Pui-In Mak. 2 Resolution FoM in 65-nm CMOS. J. Solid-State Circuits, 58(9):2543-2553, September 2023. [doi]
@article{ShiLMM23,
title = {2 Resolution FoM in 65-nm CMOS},
author = {Dan Shi and Ka-Meng Lei and Rui Paulo Martins and Pui-In Mak},
year = {2023},
month = {September},
doi = {10.1109/JSSC.2023.3269077},
url = {https://doi.org/10.1109/JSSC.2023.3269077},
researchr = {https://researchr.org/publication/ShiLMM23},
cites = {0},
citedby = {0},
journal = {J. Solid-State Circuits},
volume = {58},
number = {9},
pages = {2543-2553},
}