Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET

Chun-Hsing Shih, Yi-Min Chen, Chenhsin Lien. Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET. Microelectronics Reliability, 44(7):1069-1075, 2004. [doi]

Authors

Chun-Hsing Shih

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Yi-Min Chen

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Chenhsin Lien

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