Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET

Chun-Hsing Shih, Yi-Min Chen, Chenhsin Lien. Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET. Microelectronics Reliability, 44(7):1069-1075, 2004. [doi]

Abstract

Abstract is missing.