Chun-Hsing Shih, Yi-Min Chen, Chenhsin Lien. Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET. Microelectronics Reliability, 44(7):1069-1075, 2004. [doi]
@article{ShihCL04,
title = {Design strategy of localized halo profile for achieving sub-50 nm bulk MOSFET},
author = {Chun-Hsing Shih and Yi-Min Chen and Chenhsin Lien},
year = {2004},
doi = {10.1016/j.microrel.2004.04.002},
url = {http://dx.doi.org/10.1016/j.microrel.2004.04.002},
tags = {design},
researchr = {https://researchr.org/publication/ShihCL04},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {44},
number = {7},
pages = {1069-1075},
}