High voltage time-dependent dielectric breakdown in stacked intermetal dielectrics

Sanghoon Shin, Yen-Pu Chen, Woojin Ahn, Honglin Guo, Byron Williams, Jeff West, Tom Bonifield, Dhanoop Varghese, Srikanth Krishnan, Muhammad A. Alam. High voltage time-dependent dielectric breakdown in stacked intermetal dielectrics. In IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018. pages 9-1, IEEE, 2018. [doi]

Abstract

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