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Hausdorff Distance Driven L-Shape Matching Based Layout Decomposition for E-Beam Lithography

Arindam Sinharay, Pranab Roy, Hafizur Rahaman. Hausdorff Distance Driven L-Shape Matching Based Layout Decomposition for E-Beam Lithography. In Brajesh Kumar Kaushik, Sudeb Dasgupta, Virendra Singh, editors, VLSI Design and Test - 21st International Symposium, VDAT 2017, Roorkee, India, June 29 - July 2, 2017, Revised Selected Papers. Volume 711 of Communications in Computer and Information Science, pages 287-295, Springer, 2017. [doi]

Authors

Arindam Sinharay

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Pranab Roy

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Hafizur Rahaman

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