Arindam Sinharay, Pranab Roy, Hafizur Rahaman. Hausdorff Distance Driven L-Shape Matching Based Layout Decomposition for E-Beam Lithography. In Brajesh Kumar Kaushik, Sudeb Dasgupta, Virendra Singh, editors, VLSI Design and Test - 21st International Symposium, VDAT 2017, Roorkee, India, June 29 - July 2, 2017, Revised Selected Papers. Volume 711 of Communications in Computer and Information Science, pages 287-295, Springer, 2017. [doi]
@inproceedings{SinharayRR17, title = {Hausdorff Distance Driven L-Shape Matching Based Layout Decomposition for E-Beam Lithography}, author = {Arindam Sinharay and Pranab Roy and Hafizur Rahaman}, year = {2017}, doi = {10.1007/978-981-10-7470-7_29}, url = {https://doi.org/10.1007/978-981-10-7470-7_29}, researchr = {https://researchr.org/publication/SinharayRR17}, cites = {0}, citedby = {0}, pages = {287-295}, booktitle = {VLSI Design and Test - 21st International Symposium, VDAT 2017, Roorkee, India, June 29 - July 2, 2017, Revised Selected Papers}, editor = {Brajesh Kumar Kaushik and Sudeb Dasgupta and Virendra Singh}, volume = {711}, series = {Communications in Computer and Information Science}, publisher = {Springer}, isbn = {978-981-10-7470-7}, }