Highly Reliable/Manufacturable 4nm FinFET Platform Technology (SF4X) for HPC Application with Dual-CPP/HP-HD Standard Cells

Kihwang Son, Seulki Park, Kyunghoon Jung, Jun-Gyu Kim, Younggun Ko, Keonyong Cheon, Changkeun Yoon, Jiho Kim, Jaehun Jeong, Taehun Myung, Changmin Hong, Weonwi Jang, Min-Chul Sun, Sungil Jo, Ju-Youn Kim, Byungmoo Song, Yuri Yasuda-Masuoka, Ja-Hum Ku, Gitae Jeong. Highly Reliable/Manufacturable 4nm FinFET Platform Technology (SF4X) for HPC Application with Dual-CPP/HP-HD Standard Cells. In 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits), Kyoto, Japan, June 11-16, 2023. pages 1-2, IEEE, 2023. [doi]

Authors

Kihwang Son

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Seulki Park

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Kyunghoon Jung

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Jun-Gyu Kim

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Younggun Ko

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Keonyong Cheon

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Changkeun Yoon

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Jiho Kim

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Jaehun Jeong

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Taehun Myung

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Changmin Hong

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Weonwi Jang

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Min-Chul Sun

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Sungil Jo

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Ju-Youn Kim

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Byungmoo Song

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Yuri Yasuda-Masuoka

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Ja-Hum Ku

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Gitae Jeong

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