Yu-Hsuan Su, Yao-Wen Chang. DSA-compliant routing for two-dimensional patterns using block copolymer lithography. In Frank Liu, editor, Proceedings of the 35th International Conference on Computer-Aided Design, ICCAD 2016, Austin, TX, USA, November 7-10, 2016. pages 50, ACM, 2016. [doi]
Abstract is missing.