Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography - researchr publication authors

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Xiantao Sun, Weihai Chen, Rui Zhou 0011, Wenjie Chen, Jianbin Zhang. Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. In 2014 IEEE International Conference on Robotics and Automation, ICRA 2014, Hong Kong, China, May 31 - June 7, 2014. pages 2345-2350, IEEE, 2014. [doi]

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