Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process

L. N. Sun, T. M. H. Lee, Z. C. Yang, G. Z. Yan. Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process. In 5th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2010, Xiamen, China, January 20-23, 2010. pages 971-974, IEEE, 2010. [doi]

Authors

L. N. Sun

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T. M. H. Lee

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Z. C. Yang

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G. Z. Yan

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