Statistics of soft and hard breakdown in thin SiO::2:: gate oxides

Jordi Suñé, Ernest Y. Wu, D. Jiménez, Wing L. Lai. Statistics of soft and hard breakdown in thin SiO::2:: gate oxides. Microelectronics Reliability, 43(8):1185-1192, 2003. [doi]

@article{SuneWJL03,
  title = {Statistics of soft and hard breakdown in thin SiO::2:: gate oxides},
  author = {Jordi Suñé and Ernest Y. Wu and D. Jiménez and Wing L. Lai},
  year = {2003},
  doi = {10.1016/S0026-2714(03)00170-7},
  url = {http://dx.doi.org/10.1016/S0026-2714(03)00170-7},
  researchr = {https://researchr.org/publication/SuneWJL03},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {43},
  number = {8},
  pages = {1185-1192},
}