Characteristics of n-MOSFETs with stress effects from neighborhood devices

Wei Tai, Lele Jiang, Wang Lei, Song Wen, Lifu Chang, Yuhua Cheng. Characteristics of n-MOSFETs with stress effects from neighborhood devices. In IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013. pages 1-3, IEEE, 2013. [doi]

@inproceedings{TaiJLWCC13,
  title = {Characteristics of n-MOSFETs with stress effects from neighborhood devices},
  author = {Wei Tai and Lele Jiang and Wang Lei and Song Wen and Lifu Chang and Yuhua Cheng},
  year = {2013},
  doi = {10.1109/ASICON.2013.6812059},
  url = {http://dx.doi.org/10.1109/ASICON.2013.6812059},
  researchr = {https://researchr.org/publication/TaiJLWCC13},
  cites = {0},
  citedby = {0},
  pages = {1-3},
  booktitle = {IEEE 10th International Conference on ASIC, ASICON 2013, Shenzhen, China, October 28-31, 2013},
  publisher = {IEEE},
  isbn = {978-1-4673-6415-7},
}