Constant voltage electromigration for advanced BEOL copper interconnects - researchr publication authors

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Baojun Tang, Kris Croes, Nicolas Jourdan, Jürgen Bömmels, Zsolt Tokei, Ingrid De Wolf, Eric Wilcox, Timothy McMullen. Constant voltage electromigration for advanced BEOL copper interconnects. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 2, IEEE, 2015. [doi]

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