Baojun Tang, Kris Croes, Nicolas Jourdan, Jürgen Bömmels, Zsolt Tokei, Ingrid De Wolf, Eric Wilcox, Timothy McMullen. Constant voltage electromigration for advanced BEOL copper interconnects. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 2, IEEE, 2015. [doi]
@inproceedings{TangCJBTWWM15,
title = {Constant voltage electromigration for advanced BEOL copper interconnects},
author = {Baojun Tang and Kris Croes and Nicolas Jourdan and Jürgen Bömmels and Zsolt Tokei and Ingrid De Wolf and Eric Wilcox and Timothy McMullen},
year = {2015},
doi = {10.1109/IRPS.2015.7112685},
url = {http://dx.doi.org/10.1109/IRPS.2015.7112685},
researchr = {https://researchr.org/publication/TangCJBTWWM15},
cites = {0},
citedby = {0},
pages = {2},
booktitle = {IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015},
publisher = {IEEE},
isbn = {978-1-4673-7362-3},
}