Arthur Tay, Weng Khuen Ho, Xiaodong Wu. Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process. IEEE Trans. Contr. Sys. Techn., 15(1):99-105, 2007. [doi]
@article{TayHW07,
title = {Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process},
author = {Arthur Tay and Weng Khuen Ho and Xiaodong Wu},
year = {2007},
doi = {10.1109/TCST.2006.883244},
url = {http://dx.doi.org/10.1109/TCST.2006.883244},
researchr = {https://researchr.org/publication/TayHW07},
cites = {0},
citedby = {0},
journal = {IEEE Trans. Contr. Sys. Techn.},
volume = {15},
number = {1},
pages = {99-105},
}