Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process

Arthur Tay, Weng Khuen Ho, Xiaodong Wu. Real-Time Control of Photoresist Extinction Coefficient Uniformity in the Microlithography Process. IEEE Trans. Contr. Sys. Techn., 15(1):99-105, 2007. [doi]

Abstract

Abstract is missing.