Constrained pattern assignment for standard cell based triple patterning lithography

Haitong Tian, Yuelin Du, Hongbo Zhang, Zigang Xiao, Martin D. F. Wong. Constrained pattern assignment for standard cell based triple patterning lithography. In Jörg Henkel, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD'13, San Jose, CA, USA, November 18-21, 2013. pages 178-185, IEEE/ACM, 2013. [doi]

Abstract

Abstract is missing.