Mass patterning of polysiloxane layers using spin coating and photolithography techniques

B. TorbiƩro, M. L. Pourciel-Gouzy, I. Humenyuk, J. B. Doucet, A. Martinez, Pierre Temple-Boyer. Mass patterning of polysiloxane layers using spin coating and photolithography techniques. Microelectronics Journal, 37(2):133-136, 2006. [doi]

Abstract

Abstract is missing.