Effectiveness of High Permittivity Spacer for Underlap Regions of Wavy-Junctionless FinFET at 22 nm Node and Scaling Short Channel Effects

B. Vandana, J. K. Das, S. K. Mohapatra, B. K. Kaushik. Effectiveness of High Permittivity Spacer for Underlap Regions of Wavy-Junctionless FinFET at 22 nm Node and Scaling Short Channel Effects. In Brajesh Kumar Kaushik, Sudeb Dasgupta, Virendra Singh, editors, VLSI Design and Test - 21st International Symposium, VDAT 2017, Roorkee, India, June 29 - July 2, 2017, Revised Selected Papers. Volume 711 of Communications in Computer and Information Science, pages 545-556, Springer, 2017. [doi]

Abstract

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