Design technology co-optimization of back end of line design rules for a 7 nm predictive process design kit

Vinay Vashishtha, Ankita Dosi, Lovish Masand, Lawrence T. Clark. Design technology co-optimization of back end of line design rules for a 7 nm predictive process design kit. In 18th International Symposium on Quality Electronic Design, ISQED 2017, Santa Clara, CA, USA, March 14-15, 2017. pages 149-154, IEEE, 2017. [doi]

Abstract

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