Enhancement of adhesion strength of Cu layer with low dielectric constant SiC: H liners in Cu interconnects

Grace Wang, S. Balakumar, S. C. Hwee, Rakesh Kumar, T. Hara. Enhancement of adhesion strength of Cu layer with low dielectric constant SiC: H liners in Cu interconnects. Microelectronics Journal, 36(8):749-753, 2005. [doi]

Abstract

Abstract is missing.