Ying Wang, Fei Cao, Minghui Ding, Yun-tao Liu. Diffusion barrier performance of Zr-N/Zr bilayered film in Cu/Si contact system. Microelectronics Reliability, 48(11-12):1800-1803, 2008. [doi]
@article{WangCDL08-0,
title = {Diffusion barrier performance of Zr-N/Zr bilayered film in Cu/Si contact system},
author = {Ying Wang and Fei Cao and Minghui Ding and Yun-tao Liu},
year = {2008},
doi = {10.1016/j.microrel.2008.08.003},
url = {http://dx.doi.org/10.1016/j.microrel.2008.08.003},
researchr = {https://researchr.org/publication/WangCDL08-0},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {48},
number = {11-12},
pages = {1800-1803},
}