Miaomiao Wang, Zuoguang Liu, Tenko Yamashita, James H. Stathis, Chia-Yu Chen. Separation of interface states and electron trapping for hot carrier degradation in ultra-scaled replacement metal gate n-FinFET. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 4, IEEE, 2015. [doi]
Abstract is missing.