Chengxu Wang, Hao Yu, Yichen Wang, Zichong Zhang, Xiangshui Miao, Xingsheng Wang. Modeling and physical mechanism analysis of the effect of a polycrystalline-ferroelectric gate on FE-FinFETs. Science in China Series F: Information Sciences, 66(5), May 2023. [doi]
@article{WangYWZMW23, title = {Modeling and physical mechanism analysis of the effect of a polycrystalline-ferroelectric gate on FE-FinFETs}, author = {Chengxu Wang and Hao Yu and Yichen Wang and Zichong Zhang and Xiangshui Miao and Xingsheng Wang}, year = {2023}, month = {May}, doi = {10.1007/s11432-022-3501-7}, url = {https://doi.org/10.1007/s11432-022-3501-7}, researchr = {https://researchr.org/publication/WangYWZMW23}, cites = {0}, citedby = {0}, journal = {Science in China Series F: Information Sciences}, volume = {66}, number = {5}, }