Li Wen, Qiuping Zhang, Weiwei Xiang, Hai Wang, Jiaru Chu. Design and fabrication of the microplasma reactor for maskless scanning plasma etching. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009. pages 577-580, IEEE, 2009. [doi]
@inproceedings{WenZXWC09,
title = {Design and fabrication of the microplasma reactor for maskless scanning plasma etching},
author = {Li Wen and Qiuping Zhang and Weiwei Xiang and Hai Wang and Jiaru Chu},
year = {2009},
doi = {10.1109/NEMS.2009.5068646},
url = {http://doi.ieeecomputersociety.org/10.1109/NEMS.2009.5068646},
tags = {design},
researchr = {https://researchr.org/publication/WenZXWC09},
cites = {0},
citedby = {0},
pages = {577-580},
booktitle = {4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009},
publisher = {IEEE},
isbn = {978-1-4244-4629-2},
}