Jie Wu, Patrick Juliano, Elyse Rosenbaum. Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions. Microelectronics Reliability, 41(11):1771-1779, 2001. [doi]
@article{WuJR01,
title = {Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions},
author = {Jie Wu and Patrick Juliano and Elyse Rosenbaum},
year = {2001},
doi = {10.1016/S0026-2714(01)00033-6},
url = {http://dx.doi.org/10.1016/S0026-2714(01)00033-6},
researchr = {https://researchr.org/publication/WuJR01},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {41},
number = {11},
pages = {1771-1779},
}