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A Polynomial Time Exact Algorithm for Overlay-Resistant Self-Aligned Double Patterning (SADP) Layout Decomposition

Zigang Xiao, Yuelin Du, Hongbo Zhang, Martin D. F. Wong. A Polynomial Time Exact Algorithm for Overlay-Resistant Self-Aligned Double Patterning (SADP) Layout Decomposition. IEEE Trans. on CAD of Integrated Circuits and Systems, 32(8):1228-1239, 2013. [doi]

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