Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization - researchr publication

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Xiaoqing Xu, Brian Cline, Greg Yeric, Bei Yu, David Z. Pan. Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization. IEEE Trans. on CAD of Integrated Circuits and Systems, 34(5):699-712, 2015. [doi]

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