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Impact of Oxide Diffusion Space Effect on 14-nm FinFET Performance and Layout-Driven Optimization for Advanced Digital Circuits

Yafen Yang, Jianbin Guo, Tianyang Feng, David Wei Zhang, Hang Xu. Impact of Oxide Diffusion Space Effect on 14-nm FinFET Performance and Layout-Driven Optimization for Advanced Digital Circuits. IEEE Trans. on CAD of Integrated Circuits and Systems, 45(8):3736-3742, August 2026. [doi]

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