Haoyu Yang, Shuhe Li, Zihao Deng, Yuzhe Ma, Bei Yu 0001, Evangeline F. Y. Young. GAN-OPC: Mask Optimization With Lithography-Guided Generative Adversarial Nets. IEEE Trans. on CAD of Integrated Circuits and Systems, 39(10):2822-2834, 2020. [doi]
Abstract is missing.