GAN-OPC: mask optimization with lithography-guided generative adversarial nets - researchr publication authors

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Haoyu Yang, Shuhe Li, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young. GAN-OPC: mask optimization with lithography-guided generative adversarial nets. In Proceedings of the 55th Annual Design Automation Conference, DAC 2018, San Francisco, CA, USA, June 24-29, 2018. ACM, 2018. [doi]

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