Haoyu Yang, Shuhe Li, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young. GAN-OPC: mask optimization with lithography-guided generative adversarial nets. In Proceedings of the 55th Annual Design Automation Conference, DAC 2018, San Francisco, CA, USA, June 24-29, 2018. ACM, 2018. [doi]
@inproceedings{YangLMYY18,
title = {GAN-OPC: mask optimization with lithography-guided generative adversarial nets},
author = {Haoyu Yang and Shuhe Li and Yuzhe Ma and Bei Yu and Evangeline F. Y. Young},
year = {2018},
doi = {10.1145/3195970.3196056},
url = {http://doi.acm.org/10.1145/3195970.3196056},
researchr = {https://researchr.org/publication/YangLMYY18},
cites = {0},
citedby = {0},
booktitle = {Proceedings of the 55th Annual Design Automation Conference, DAC 2018, San Francisco, CA, USA, June 24-29, 2018},
publisher = {ACM},
}