TEMPO: Fast Mask Topography Effect Modeling with Deep Learning - researchr publication authors

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Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, David Z. Pan. TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. In William Swartz, Jens Lienig, editors, ISPD 2020: International Symposium on Physical Design, Taipei, Taiwan, March 29 - April 1, 2020, delayed to September 20-23, 2020. pages 127-134, ACM, 2020. [doi]

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