Wei Ye, Mohamed Baker Alawieh, Yuki Watanabe, Shigeki Nojima, Yibo Lin, David Z. Pan. TEMPO: Fast Mask Topography Effect Modeling with Deep Learning. In William Swartz, Jens Lienig, editors, ISPD 2020: International Symposium on Physical Design, Taipei, Taiwan, March 29 - April 1, 2020, delayed to September 20-23, 2020. pages 127-134, ACM, 2020. [doi]
@inproceedings{YeAWNLP20,
title = {TEMPO: Fast Mask Topography Effect Modeling with Deep Learning},
author = {Wei Ye and Mohamed Baker Alawieh and Yuki Watanabe and Shigeki Nojima and Yibo Lin and David Z. Pan},
year = {2020},
doi = {10.1145/3372780.3375565},
url = {https://doi.org/10.1145/3372780.3375565},
researchr = {https://researchr.org/publication/YeAWNLP20},
cites = {0},
citedby = {0},
pages = {127-134},
booktitle = {ISPD 2020: International Symposium on Physical Design, Taipei, Taiwan, March 29 - April 1, 2020, delayed to September 20-23, 2020},
editor = {William Swartz and Jens Lienig},
publisher = {ACM},
isbn = {978-1-4503-7091-2},
}