D. Q. Yu, W. S. Lau, Hei Wong, Xuan Feng, Shurong Dong, Kin Leong Pey. 5/W MIM capacitors with the thickness of the bottom W electrode. Microelectronics Reliability, 61:95-98, 2016. [doi]
@article{YuLWFDP16,
title = {5/W MIM capacitors with the thickness of the bottom W electrode},
author = {D. Q. Yu and W. S. Lau and Hei Wong and Xuan Feng and Shurong Dong and Kin Leong Pey},
year = {2016},
doi = {10.1016/j.microrel.2016.02.013},
url = {http://dx.doi.org/10.1016/j.microrel.2016.02.013},
researchr = {https://researchr.org/publication/YuLWFDP16},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {61},
pages = {95-98},
}