Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, Yibo Lin, Zhuo Li 0001, Charles J. Alpert, David Z. Pan. Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography. IEEE Trans. on CAD of Integrated Circuits and Systems, 34(5):726-739, 2015. [doi]
Abstract is missing.