The need for multi-scale approaches in Cu/low-k reliability issues

Cadmus A. Yuan, Olaf van der Sluis, Willem D. van Driel, G. Q. (Kouchi) Zhang. The need for multi-scale approaches in Cu/low-k reliability issues. Microelectronics Reliability, 48(6):833-842, 2008. [doi]

Authors

Cadmus A. Yuan

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Olaf van der Sluis

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Willem D. van Driel

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G. Q. (Kouchi) Zhang

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