Cadmus A. Yuan, Olaf van der Sluis, Willem D. van Driel, G. Q. (Kouchi) Zhang. The need for multi-scale approaches in Cu/low-k reliability issues. Microelectronics Reliability, 48(6):833-842, 2008. [doi]
@article{YuanSDZ08,
title = {The need for multi-scale approaches in Cu/low-k reliability issues},
author = {Cadmus A. Yuan and Olaf van der Sluis and Willem D. van Driel and G. Q. (Kouchi) Zhang},
year = {2008},
doi = {10.1016/j.microrel.2008.03.024},
url = {http://dx.doi.org/10.1016/j.microrel.2008.03.024},
tags = {reliability, systematic-approach},
researchr = {https://researchr.org/publication/YuanSDZ08},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {48},
number = {6},
pages = {833-842},
}