Kun Yuan, Jae-Seok Yang, David Z. Pan. Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization. IEEE Trans. on CAD of Integrated Circuits and Systems, 29(2):185-196, 2010. [doi]
@article{YuanYP10,
title = {Double Patterning Layout Decomposition for Simultaneous Conflict and Stitch Minimization},
author = {Kun Yuan and Jae-Seok Yang and David Z. Pan},
year = {2010},
doi = {10.1109/TCAD.2009.2035577},
url = {http://dx.doi.org/10.1109/TCAD.2009.2035577},
tags = {layout},
researchr = {https://researchr.org/publication/YuanYP10},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {29},
number = {2},
pages = {185-196},
}