Layout decomposition with pairwise coloring for multiple patterning lithography - researchr publication authors

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Ye Zhang, Wai-Shing Luk, Hai Zhou, Changhao Yan, Xuan Zeng. Layout decomposition with pairwise coloring for multiple patterning lithography. In Jörg Henkel, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD'13, San Jose, CA, USA, November 18-21, 2013. pages 170-177, IEEE/ACM, 2013. [doi]

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