Layout decomposition with pairwise coloring for multiple patterning lithography

Ye Zhang, Wai-Shing Luk, Hai Zhou, Changhao Yan, Xuan Zeng. Layout decomposition with pairwise coloring for multiple patterning lithography. In Jörg Henkel, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD'13, San Jose, CA, USA, November 18-21, 2013. pages 170-177, IEEE/ACM, 2013. [doi]

@inproceedings{ZhangLZYZ13-0,
  title = {Layout decomposition with pairwise coloring for multiple patterning lithography},
  author = {Ye Zhang and Wai-Shing Luk and Hai Zhou and Changhao Yan and Xuan Zeng},
  year = {2013},
  url = {http://dl.acm.org/citation.cfm?id=2561864},
  researchr = {https://researchr.org/publication/ZhangLZYZ13-0},
  cites = {0},
  citedby = {0},
  pages = {170-177},
  booktitle = {The IEEE/ACM International Conference on Computer-Aided Design, ICCAD'13, San Jose, CA, USA, November 18-21, 2013},
  editor = {Jörg Henkel},
  publisher = {IEEE/ACM},
  isbn = {978-1-4799-1069-4},
}