A novel p+ Poly-SiGe Gate CMOS device

Jing Zhang, Kaizhou Tan, Siliu Xu, Zhengfan Zhang, Yukui Liu, Guangbing Chen, Kaicheng Li, Heming Zhang, Huiyong Hu. A novel p+ Poly-SiGe Gate CMOS device. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009. pages 480-484, IEEE, 2009. [doi]

Abstract

Abstract is missing.