AdaOPC: A Self-Adaptive Mask Optimization Framework for Real Design Patterns

Wenqian Zhao, Xufeng Yao, Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu 0001, Martin D. F. Wong. AdaOPC: A Self-Adaptive Mask Optimization Framework for Real Design Patterns. In Tulika Mitra, Evangeline Young, Jinjun Xiong, editors, Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2022, San Diego, California, USA, 30 October 2022 - 3 November 2022. pages 123, ACM, 2022. [doi]

Abstract

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