A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching Process Simulation

Zai-Fa Zhou, Qing-An Huang, Wei-Hua Li, Wei Lu. A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching Process Simulation. IEEE Trans. on CAD of Integrated Circuits and Systems, 26(1):100-114, 2007. [doi]

Abstract

Abstract is missing.