Overlapping-aware throughput-driven stencil planning for E-beam lithography

Jian Kuang 0001, Evangeline F. Y. Young. Overlapping-aware throughput-driven stencil planning for E-beam lithography. In Yao-Wen Chang, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014, San Jose, CA, USA, November 3-6, 2014. pages 254-261, IEEE/ACM, 2014. [doi]

Authors

Jian Kuang 0001

This author has not been identified. Look up 'Jian Kuang 0001' in Google

Evangeline F. Y. Young

This author has not been identified. Look up 'Evangeline F. Y. Young' in Google