Jian Kuang 0001, Evangeline F. Y. Young. Overlapping-aware throughput-driven stencil planning for E-beam lithography. In Yao-Wen Chang, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014, San Jose, CA, USA, November 3-6, 2014. pages 254-261, IEEE/ACM, 2014. [doi]
@inproceedings{0001Y14-1,
title = {Overlapping-aware throughput-driven stencil planning for E-beam lithography},
author = {Jian Kuang 0001 and Evangeline F. Y. Young},
year = {2014},
url = {http://dl.acm.org/citation.cfm?id=2691416},
researchr = {https://researchr.org/publication/0001Y14-1},
cites = {0},
citedby = {0},
pages = {254-261},
booktitle = {The IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2014, San Jose, CA, USA, November 3-6, 2014},
editor = {Yao-Wen Chang},
publisher = {IEEE/ACM},
isbn = {978-1-4799-6277-8},
}