David Alvarez, Kiran V. Chatty, Christian Russ, Michel J. Abou-Khalil, Junjun Li, Robert Gauthier, Kai Esmark, Ralph Halbach, Christopher Seguin. Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology. Microelectronics Reliability, 49(12):1417-1423, 2009. [doi]
@article{AlvarezCRALGEHS09, title = {Design optimization of gate-silicided ESD NMOSFETs in a 45 nm bulk CMOS technology}, author = {David Alvarez and Kiran V. Chatty and Christian Russ and Michel J. Abou-Khalil and Junjun Li and Robert Gauthier and Kai Esmark and Ralph Halbach and Christopher Seguin}, year = {2009}, doi = {10.1016/j.microrel.2009.06.051}, url = {http://dx.doi.org/10.1016/j.microrel.2009.06.051}, tags = {optimization, design}, researchr = {https://researchr.org/publication/AlvarezCRALGEHS09}, cites = {0}, citedby = {0}, journal = {Microelectronics Reliability}, volume = {49}, number = {12}, pages = {1417-1423}, }