Top-Down Approach to Technology Migration for Full-Custom Mask Layouts - researchr publication authors

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Z. V. Apanovich, Alexander G. Marchuk. Top-Down Approach to Technology Migration for Full-Custom Mask Layouts. In 11th International Conference on VLSI Design (VLSI Design 1991), 4-7 January 1998, Chennai, India. pages 48-52, IEEE Computer Society, 1998. [doi]

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